ラボデスクトップシングルターゲット真空マグネトロンDCスパッタリングpvdコーター
Contact Info
- 住所:No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, , Henan, China, Zip: 450000
- 接觸する: jibin wang
- 電話番號:86 371 5519 9322
- 電子メール:wjb@cykeyi.com
その他の製品
Small desktop single-target DC magnetron sputtering coater CY-MSP180G-DG
Small desktop single-target DC magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It has the characteristics of miniaturization and standardization.
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The magnetron target head has 1 inch and 2 inches to choose from. Customers can choose the target according to the size of the substrate to be plated.
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The device is equipped with 150W DC power supply, which can be used for metal sputter coating.
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The coating machine is equipped with gas inlet port for the introduction of protective gas. If the customer needs the mixed gases, the staff can be contacted to configure the high-precision mass flow meter to meet the experimental needs.
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The instrument is equipped with advanced turbomolecular pump set, the ultimate vacuum is up to 1.0E-5pa, and other types of molecular pumps are also available.
Small desktop single-target DC magnetron sputtering coater application:
The device can be used to prepare single-layer ferroelectric thin films, conductive films, alloy films, and so on. Compared with similar equipment, the single-target magnetron sputtering coater is compact, highly integrated and small in size, and can be placed on a desktop. It is an ideal equipment for laboratory preparation of material films.
Small desktop single-target DC magnetron sputtering coater technical parameters:
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Sample stage |
Size |
φ138mm |
Temperature control accuracy |
±1℃ |
|
Heating temperature |
Max 500℃ |
Rotate speed |
1-20rpm adjustable |
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Magnetron Sputtering target head |
Quantity |
2”×1 (1”,2” optional) |
Water chiller |
Circulating water chiller with flow rate of 10L/min |
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Cooling mode |
Water cooling |
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Vacuum chamber |
Chamber size |
φ180mm×215mm |
Watch window |
Omnidirectional transparent |
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Chamber material |
High purity quartz |
Opening mode |
Top cover removable |
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Vacuum system |
Model |
CY-GZK103-A |
Pumping interface |
KF40 |
|
Molecular pump |
CY-600 |
Exhaust interface |
KF16 |
|
|
Backing pump |
rotary vane pump |
Vacuum measurement |
Compound vacuum gauge |
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Ultimate vacuum |
1.0E-5Pa |
Power supply |
AC;220V 50/60Hz |
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Pumping rate |
Molecular pump: 600L/S rotary vane pump: 1.1L/S Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes |
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Power configuration |
Quantity |
DC power supply x1 |
Max output power |
150W |
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Other parameters |
Supply voltage |
AC220V,50Hz |
Overall size |
|
|
Total power |
1.7KW (Vacuum pump1.5KW+machine0.2KW) |
Total Weight |
About 30kg |
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| 業(yè)界カテゴリ: | Hardware & Tools/Other Bench Tools |
|---|---|
| 製品カテゴリ: | magnetron sputtering coating |
| ブランドBrand: | TN |
| 仕様: | TN-MSP180G-DG |
| Stock: | |
| Origin: |
