Factory transfer of 1 OTFC-1550 coating machine (Year: November 2015), including on-site installation and training. The company also has various advanced sputtering and evaporation machines, undertaking high-performance mid-to-long wave infrared optical windows, filters for various wavebands, optoelectronic components, and customized services.

Sales Technology Manager Yang: 18103045976

Vacuum chamber: SUS304, Ф1550*1800MM

Workpiece holder: Ф1400

Workpiece holder rotation speed: 10rpm to 30rpm (variable)

Optical thickness control: HOM2--R-VIS350A

Optical thickness monitor: Wavelength range: 350nm to 1100nm | Reflective/Transmissive

Crystal thickness monitor: XTC/3+6-point crystal sensor

Evaporation sources: 2 sets of Japan Electron 16P dual guns

Ion source: 23-inch Guangsheng RF ion source

Exhaust system: 2 mechanical pumps, diffusion pump Polycold (or 2 cryopumps) 275 mechanical pump + Edwards matching Roots pump

Performance

Achievable pressure: Below 7.0X10??Pa

Exhaust time: 20 minutes (atmospheric pressure ~1.3X10?3Pa)

Substrate temperature: Maximum: 350°C

Operating conditions

Equipment dimensions: 5000mm(W) x 7200mm(D) x 5370mm(H)

Power supply: 3-phase, 200V, 50/60Hz, approximately 120KVA

Water flow rate: 180 liters/minute or above

Air pressure: 0.5MPa or above

Weight: Approximately 11000kg