I. Product Introduction
The PTFE acid tank cleaning tank is specifically designed for industries such as semiconductors, photovoltaics, and optoelectronics. It is integrally molded, eliminating concerns about liquid leakage. It is primarily used for soaking and cleaning baskets containing chips, silicon wafers, and battery cells. Its key features include resistance to the corrosiveness of cleaning solutions, low metal element values, no dissolution or precipitation, and no contamination of chips, wafers, etc.
Semiconductor wafer cleaning tank dimensions can be customized as required. Matching lids can also be customized to prevent contamination.
II. Features:
2. High and low temperature resistance: -200°C to +250°C
3. Corrosion resistance: Resistant to strong acids, strong alkalis, aqua regia, hydrofluoric acid, and various organic solvents;
4. Insulation resistance: Dielectric properties are independent of temperature and frequency;
5. Contamination prevention: Low background values, with metal elements lead and uranium content less than 0.01 ppb;
6. Low dissolution and precipitation, ensuring no contamination of chips, wafers, silicon wafers, etc.;
8. Stable chemical performance, good recoverability, and resistance to deformation;
9. Teflon plastic, durable and not easily broken.