The Yidu Intelligent MC100 Series is a laminar mass flow controller for industrial equipment gas circuit systems. It is compatible with multiple gases and offers advantages such as high precision, high repeatability, fast response, and high stability.

Features:

l Principle: Laminar differential pressure principle

l Convenient Operation: Provides PC software for flow rate setting.

l Core Advantages: Single unit supports multiple gases, fast response time, and autonomous operation after setting.

l Wide Temperature and Pressure Range: -20℃ to 60℃, within 1Mpa

l Real-time Display of 5 Process Variables

l Built-in Support for Over 70 Gases, Easy Gas Switching, No Need to Look Up or Input Coefficients, Supports Custom Mixed Gases

l No Warm-up Time Required, Ready to Use Immediately After Startup, Reducing Waste of Precious Gas Sources.

Product Specifications:

l Model: MC100

l Range: 0.5sccm to 5000slpm

l Valve Type: N/C (Normally Closed)

Performance Parameters:

l Accuracy: ±1.0% S.P. (Set Value) (20% to 100% Range)   ±0.2% F.S. (Full Scale) (1% to 10% Range)

l Repeat Accuracy: ±0.2% F.S.

l Pressure Drift: Zero: ≤±0.2% F.S./100kPaA;    Span: ≤±0.2% F.S./100kPaA (Reference 100kPaA)

l Temperature Drift: Zero: ≤±0.02% F.S./℃;             Span: ≤±0.02% F.S./℃ (Reference Temperature 25℃)

l Zero Drift: ±0.2% F.S./Year

l Operating Range: 1% to 100% F.S.

l Response Time: ≤700ms

l Startup Warm-up Time: 1s

Usage Conditions:

l Medium Temperature: -20℃ to 60℃

l Ambient Temperature: -20℃ to 50℃

l Operating Humidity: 0% to 98% (Non-Condensing)

l Operating Pressure: 0 to 1Mpa

l Withstanding Pressure: 1.5Mpa

l Operating Differential Pressure Range: 100kPa to 600kPa

l Power Supply Voltage: 24V ±20%

l Current Consumption: <500mA (<12V)

l Installation Method: Any Angle

l Gas Connection Material: SUS316L

l Inlet/Outlet: Pipe Thread (Internal Thread)

l Gas Connection Seal Material: Rubber Ring Seal: Fluororubber

Communication Methods:

l Digital Signals: RS485, Profibus

l Analog Signals: 4-20mA, 0-5V

Application Scenarios

l Gas Flow Control in Diamond Production Processes

l Gas Flow Control in CVD Equipment

l Gas Flow Control in Chemical Vapor Deposition

The MC100laminar mass flow controller for industrial equipment gas circuit systemscomes with built-in support for multiple gases, making it convenient for users. Its fast response enables quick error correction and resistance to gas source pressure fluctuations. The laminar differential pressure principle ensures high reliability and stability. Equipped with high-precision temperature and pressure sensors, the product offers extremely low temperature and pressure drift, excellent long-term stability, and accurate and stable continuous online operation control.